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AE Introduces Three New Process
Power Products
Advanced Energy unveiled three new solutions for advanced technology node semiconductor wafer processing
during the SEMICON® West 2020.
eVoS™ LE: AE introduces its eVoS platform, a
wholly new non-sinusoidal plasma power technology
that enables tightly targeted ion energy control, which is
increasingly important
for advanced etch
and deposition processes used to create
leading-edge device
features at 5nm and
below. Providing an
alternative to conventional sinusoidal RF
bias plasma power that uses complex multi-frequency
systems, eVoS is designed to produce customized narrow
ion energy distributions in a singular solution. AE’s
solution enables more direct control of ion energy distributions, better bias power efficiency and less power
loss than conventional solutions, all benefits necessary
to create increasingly challenging 3D IC features. eVoS
LE (Low Energy) offers precise power control for critical
plasma-based applications, such as atomic layer etch
(ALE), etch, clean, deposition and atomic layer deposition (ALD).
Navigator® II FCi: Building on the success of its
industry-leading Navigator II impedance matching
network platform, AE introduces Navigator II FCi, a
new, faster solid-state matching network that improves
value, speed and tune range compared to standard
matching network products. Based on high speed PINdiode technology, Navigator II FCi complements AE’s
first-to-market Navigator II FastCap™ solid-state match,
www.semiconductordigest.com
broadening the power and impedance range and improving response times to sub-milliseconds. With no
moving parts, the Navigator II FCi’s reliability and reproducibility exceed that of traditional vacuum capacitor
matches. The Navigator II FCi is available to enable
advanced ALE applications with capabilities extended to
support an ever-broadening range of applications to meet
new market requirements. The Navigator II FCi highspeed PIN-diode technology is also now available in the
novel integrated match and generator RF power delivery
system, Paramount HFi.
Paramount® HFi: The benefits of a high performance,
low cost integrated RF power system come in Paramount
HFi’s small footprint, meeting the stringent requirements of today’s most advanced deposition tools. AE
developed the industry’s first commercially viable, fully
integrated generator and match
delivery system in
2000 with its Apex
product. Apex remains a deposition
RF power workhorse, capable of
switching between
four discrete tune
range positions. The new Paramount HFi substantially
extends this concept with 32 tune range positions, an
upgraded fully digital control system and a new VI (RF
metrology) sensor. With these new capabilities and its
widened operating window, the Paramount HFi provides
advanced process control, high repeatability, a common
exciter mode to synchronize multiple systems in cluster
configurations and advanced communication protocol
(EtherCAT). The Paramount HFi’s compact size, millisecond response times and high reliability make it ideal
for today’s short duration deposition process steps, and
where speed and reliability are increasingly viewed as
critical enablers in processing advanced NAND and
other high repetition stack devices.
AE product experts will host product previews and
meetings with exhibition attendees via AE’s virtual
booth during SEMICON West 2020.
Tuesday, July 21 | 13